Semiconductor Sulfuric acid Semiconductor Sulfuric acid
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Semiconductor
Sulfuric acid
When processing a wafer, organic and metal contaminants on the silicon surface are easily oxidized and removed by adding high-purity sulfuric acid.
We have 17 lines in Korea Zinc Onsan plant and are stably producing high-purity sulfuric acid.
Purpose of the Product
- Cleaning and Etching for Semiconductor Manufacturing Process
- Chemical & Fertilizer Industry
- Metal Refining
- Fiber Industry
- Steel Making
- Paper Manufacturing industry
- Spinning and Weaving Industry
Details
| Standard Specification (%) | |
|---|---|
| Assay | 96.0 ± 0.5% |
| Metal Impurities | ||||||
|---|---|---|---|---|---|---|
| Arsenic (As) | Antimony (Sb) | Aluminum (Al) | Barium (Ba) | Berylium (Be) | Bismuth (Bi) | Cadmium (Cd) |
| 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max |
| Calcium (Ca) | Chromium (Cr) | Cobalt (Co) | Copper (Cu) | Potassium (K) | Gallium (Ga) | Germanium (Ge) |
| 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max |
| Gold (Au) | Iron (Fe) | Lead (Pb) | Lithium (Li) | Magnesium (Mg) | Manganese (Mn) | Molybdenum (Mo) |
| 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max |
| Nickel (Ni) | Niobium (Nb) | Zirconium (Zr) | Selenium (Se) | Silicon (Si) | Silver (Ag) | Sodium (Na) |
| 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max |
| Strontium (Sr) | Tantalum (Ta) | Thallium (Tl) | Tin (Sn) | Titanium (Ti) | Vanadium (V) | Zinc (Zn) |
| 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max | 0.1Max |
| Packing | Volume | Construction of Material |
|---|---|---|
| ISO Container | 12,000L | Teflon Lined sus 304 |
| IBC | 1,000L | |
| Drum | 200L | HDPE |
| Uses |
|---|
| Cleaning and Etching for Semiconductor Manufacturing Process |